发明名称 |
METHOD FOR CHANGING CONDUCTIVITY TYPE OF GALLIUM NITRIDE COMPOUND SEMICONDUCTOR TO P-TYPE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for changing the conductivity type of a gallium nitride compound semiconductor doped with p-type impurities to a low-resistivity p-type. SOLUTION: A gallium nitride compound semiconductor layer containing p-type impurities is grown by vapor deposition using nitrogen gas containing hydrogen. Then the layer is annealed to remove hydrogen and turned to a p-type gallium nitride compound semiconductor layer. If the annealing time is set to 10min., the resistivity of the GaN layer doped with Mg as p-type impurity starts decreasing suddenly at a temperature exceeding 400 deg.C and a constantly low resistivity as p-type characteristics is exhibited at 700 deg.C and higher, which is an effect of the annealing. |
申请公布号 |
JPH10178208(A) |
申请公布日期 |
1998.06.30 |
申请号 |
JP19970098495 |
申请日期 |
1997.03.31 |
申请人 |
NICHIA CHEM IND LTD |
发明人 |
NAKAMURA SHUJI;IWASA SHIGETO |
分类号 |
H01L21/205;H01L21/324;H01L27/12;H01L33/32;H01S5/00;H01S5/323 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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