| 摘要 |
PROBLEM TO BE SOLVED: To confirm the working distance between a pellicle film and a measurement optical system without reducing a throughput when measuring a pattern such as a mask and a reticle using the pellicle film. SOLUTION: The initial value of the height of a pellicle film 9 and atmospheric pressure data and temperature data near a pellicle 8 when obtaining the initial value are obtained by a pressure sensor 4 and a thermistor 5. After that, atmospheric pressure data and temperature data near the pellicle 8 are obtained at each fixed time and the height of the pellicle film 9 is calculated based on the atmospheric pressure data and temperature data and the initial value of the height of the pellicle film 9, thus confirming the working distance between a measurement optical system 2 and the pellicle 8. |
