| 摘要 |
PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. excellent in sensitivity, resolution and pattern shape and capable of stably forming a high precision fine resist pattern by incorporating a specified copolymer and a radiation sensitive acid generating agent. SOLUTION: This radiation sensitive resin compsn. contains a copolymer having repeating units represented by formula I and repeating units represented by formula II and a radiation sensitive acid generating agent. In the formula I, R<1> is H or methyl. In the formula II, each of R<2> -R<4> is H or methyl, R<5> is 1-6C alkylene or 2-6C alkylidene, R<6> is 1-10C straight chain or branched alkyl, 1-10C straight chain or branched haloalkyl, 3-11C cycloalkyl, 6-10C aryl or 7-11C aralkyl and (n) is an integer of 0-5. A mixture of two or more kinds of copolymers may be used. |
