发明名称 EXPOSURE MASK FOR COLOR FILTER FORMATION AND EXPOSURE METHOD AND DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To improve productivity for color filters used for liquid crystal display device, etc. SOLUTION: Openings 40 for blue, openings 41 for green, openings 42 for red, and openings 43 for black matrix are formed in a mask plate 37. The openings 40-43 are formed in the shape of a thin, long rectangle like a band. The openings 40-43 are grouped according to the same color and the grouped openings are arranged in the directions of the widths of the openings. Filter members 45-48 corresponding to the colors are arranged on the openings 40-43, respectively. A photoreceptive film 10 is carried in the longitudinal directions of the openings of an exposure mask 22 and a mask pattern is subjected to exposure of the photosensitive film 10. This makes exposure time short compared with time required for beam scan exposure, improves the productivity, and, in addition, eliminates decrease in peripheral accuracy.</p>
申请公布号 JPH10177240(A) 申请公布日期 1998.06.30
申请号 JP19960337371 申请日期 1996.12.17
申请人 FUJI PHOTO FILM CO LTD 发明人 TSUYUKI ISAO;GOUSHIYUU KOUJI;SERIZAWA KEIJI
分类号 G03C5/00;G02B5/20;G03B27/02;G03C5/08;G03C7/12;(IPC1-7):G03C5/00 主分类号 G03C5/00
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