| 摘要 |
PROBLEM TO BE SOLVED: To prevent a contaminant floating in a clean room from adhering to a wafer and the characteristics of the wafer from deteriorating due to a long-term storage by providing an opening for ventilation on the bottom surface of a wafer box. SOLUTION: Air flows from the entrance side of a lid toward a bottom part also in a wafer box 1 along the flow of air of the down flow of a clean room flowing from the upper part to the lower part in the state while the upper lid of the wafer box 1 is open in a down-flow type clean room. Then, since the bottom part is open in the wafer box 1, air passes through an opening and flows downward, thus reducing the possibility of contamination of a wafer 3 accommodated in the wafer box 1 due to a floating contaminant in the clean room due to air flow. |
