PATTERN COMPARISON INSPECTION DEVICE, ITS METHOD, AND MEDIUM RECORDING PATTERN COMPARING AND VERIFYING PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a pattern comparison inspection device which can automatically discriminates such a difference that becomes an issue on the quality of a mask from such a slight difference that does not become an issue on the quality of the mask. SOLUTION: A pattern comparison inspection device is incorporated with an occupation ratio calculating section 23 which divides pattern data in a picture element area and calculates the occupation ratio of the divided pattern data to the picture element area, a gray-level bit map preparing section 24 which prepares a gray-level bit map based on the occupation ratio of the divided pattern data, and a bit-map comparing section 27 which discriminates whether or not designed pattern data coincide with pattern data for an electron beam plotting device by comparing the gray-level bit map of the designed pattern data prepared by means of the preparing section 24 with the gray-level bit map of the pattern data for electron beam plotting device.