发明名称 |
METHOD OF INSPECTING MASKS |
摘要 |
PURPOSE:To solve the troublesomeness of alignments and to shorten the inspection time by performing the comparison inspection of various types of photo masks being measured with the use of one standard mask. |
申请公布号 |
JPS5222479(A) |
申请公布日期 |
1977.02.19 |
申请号 |
JP19750098751 |
申请日期 |
1975.08.13 |
申请人 |
FUJITSU LTD |
发明人 |
OSANAMI TSUNEHIRO |
分类号 |
G01B11/00;G01N21/88;G01N21/93;G01N21/956;G03F1/00;G03F1/08;H01L21/027;H01L21/302;H01L21/66 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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