| 摘要 |
<p>PROBLEM TO BE SOLVED: To realize reduction of the production cost and the improvement in throughput and reliability by enabling the application of an org. liquid crystal oriented film having the proved records in use of liquid crystal display, and transmission type liquid crystal display device though, heretofore, an inorg. liquid crystal oriented film by a diagonal vapor deposition method have to be applied as the liquid crystal oriented film on the surface of the reflection electrode layer of the reflection type liquid crystal display device. SOLUTION: A thin film 23 of silicon oxide or aluminum oxide is formed by a sputtering method, etc., on the surface on the reflection electrode layer 9 side of an active element substrate 21 and an org. liquid crystal oriented film 24 is formed on the upper side thereof. The thin film 23 has transparency and insulation characteristic and has the affinity to ink of polyimide or the like which is the material of the org. liquid crystal oriented film 24. The good wettability of the ink is obtd. and the formation of the uniform and flat org. liquid crystal oriented film 24 is made possible.</p> |
