发明名称 Plasma diffusion control apparatus
摘要 A plasma diffusion control apparatus is provided with a plurality of wires through which current flows in parallel so that lines of magnetic force are generated in a direction parallel to the plasma wall of the diffusion chamber wall. It is preferable that the wires are located in the neighborhood of the diffusion chamber at equal intervals, and arranged so that the direction of the magnetic field generated by wires are parallel to the direction of movement of the plasma. Since the magnetic field is formed in a direction parallel to the inner wall of the diffusion chamber, it is possible to prevent the diffusion of the plasma to the chamber wall. As a result there is no region which is influenced by strong local magnetic fields perpendicular to the plasma chamber wall, so that it is possible to solve the problems caused by substantial amounts of polymer deposition on the inner wall of the plasma diffusion chamber.
申请公布号 US5772772(A) 申请公布日期 1998.06.30
申请号 US19960698362 申请日期 1996.08.15
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHI, KYEONG-KOO
分类号 C23F4/00;H01J37/32;H01L21/00;H01L21/223;H01L21/302;H01L21/3065;H05H1/02;(IPC1-7):C23C16/00 主分类号 C23F4/00
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