SUBSTRATE-TRANSPORTING HAND AND POLISHING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate transporting hand which can surely receive a substrate (semiconductor wafer) from another equipment and can prevent the received substrate from being contaminated with a liquid adhering to the hand. SOLUTION: A hand 1 has a housing section 11 for housing substrate and guides 31 and 31 on the outside of the section 11. The housing section 11 has contacting surfaces 13 and 13 with which the outer peripheries of the lower surface of the substrate come into contact and a central surface 15 which is formed lower than the contacting surfaces 13 on the inside of the contacting surfaces 13 and 13. The level difference between the contacting surfaces 13 and 13 and the central surface 15 is make larger than the height of the largest drop formed of a liquid adhering to the central surface 15 by surface tension. An opening 17 is provided at the center of the central surface 15 and a tapered section P for drainage is formed by inclining the central surface 15. In addition, tapered guide surfaces 33 and 33 are respectively provided at the upper ends of the guides 31 and 31.