| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method of light opaque materials with which the prevention of the movement or peeling of already formed patterns, the possession of excellent pattern reproducibility and the formation at desired film thicknesses are possible at the time of forming the various patterns consisting of >=2 kinds of the light opaque materials. SOLUTION: This pattern forming method consists in forming the patterns consisting of >=2 kinds of the light opaque material by successively repeating the stages of forming a photosensitive compsn. layer of which the tacky adhesiveness is lost by the irradiation with the active rays on a substrate, exposing the patterns to this photosensitive compsn. layer, applying particles contg. the light opaque materials and binders on its surface to selectively adhere these particles to the tacky adhesive regions, thereafter, not adhered particles are removed and sticking the adhered particles together with the photosensitive compsn. layer to the substrate by heating and/or exposing. The substrate is thereafter heated to 350 to 600 deg.C to burn out the photosensitive compsns. and the binders, by which the patterns of the light opaque materials are formed. |
