| 摘要 |
PROBLEM TO BE SOLVED: To blow a fuse without damaging a substrate, an insulating film and the like which constitute a semiconductor device by a method wherein a laser beam in a first operation is made comparatively intense, the intensity of a laser beam in a second operation onward is made lower than that of the laser beam in the first operation and the laser beam is applied. SOLUTION: In a laser repair apparatus, a laser beam 22 is generated by a laser head 10, and its energy intensity is adjusted by a controller 11 which controls a laser driving current. The laser beam which is used to blow a fuse is applied a plurality of numbers of times. The energy intensity of a laser beam in a first operation is set to be half that of a laser beam in a second operation onward, and the laser beam is applied fives times as a limit. The energy intensity of the laser beam in the first operation is set in a range of 1.2 to 1.8μJ, and that in the second operation onward is set in a range of 0.6 to 0.9μJ. When the laser beam is applied, a good result is obtained.
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