发明名称 METHOD FOR USING Z-AXIS MATERIAL TEMPORARILY
摘要 PROBLEM TO BE SOLVED: To reliably screen semiconductor wafers by providing a burn-in base unit having a high-flatness base, soft and reusable Z-axis unit and wafer level contact sheet laminated on the Z-axis unit. SOLUTION: A base unit 7, soft and selectively conductive Z-axis member 8, laminate type wafer level contact sheet 9, chuck 1 for receiving a semiconductor wafer 1 and test signal generator 10 are provided. The base unit 7 has a high-flatness structure and extends over one or more edges of the wafer 1. The wafer level contact sheet 9 may have substantially the same size as the wafer 1 and has contact pads 20 in a pattern corresponding to contact pads 3 on the wafer 1 and first terminals 13. The selectively conductive member 8 provides electric contact between the first terminal 13 of the base unit 7 and current pad 20 on the wafer level contact sheet 9.
申请公布号 JPH10173016(A) 申请公布日期 1998.06.26
申请号 JP19970323812 申请日期 1997.11.10
申请人 W L GORE & ASSOC INC 发明人 BUDNAITIS JOHN J
分类号 G01R31/26;G01R1/067;G01R1/073;G01R31/28;H01L21/326;H01L21/66;H01L23/498;(IPC1-7):H01L21/66 主分类号 G01R31/26
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