| 摘要 |
PROBLEM TO BE SOLVED: To work with precise processing by forming a pattern providing a working amount with the same process as a magneto-resistive effect film and forming target patterns with electrode patterns having thickness of 0.1μm or above on its both sides. SOLUTION: A drawing conductor 11 of thickness 300nm is retrieved first by a stereomicroscope from a processing side while processing or when the processing is ended. Thereafter, the presence of the magneto-resistive effect film 10 of thickness 20nm is detected by an optical microscope. At this time, when the pattern is arranged beforehand so that the magneto-resistive effect film 10 disappears when the required processing amount (element height) is obtained, the matter that a magnetic head becomes the specified element height corresponding to that is discriminated by the disappearance of the magneto- resistive effect film 10. Further, this optical read pattern is one formed in the process forming a real element, and the necessity that the process is added for the optical read pattern is eliminated.
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