发明名称 ISOLATION OF NOVOLAK RESIN WITHOUT HIGH TEMPERATURE DISTILLATION AND PHOTORESIST COMPOSITION THEREFROM
摘要 <p>The present invention provides a method for producing a water insoluble, aqueous alkali soluble novolak resins fractions having consistent molecular weight and superior performance in photoresist composition, by fractionating novolak resins according to molecular weight. A method is also provided for producing photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.</p>
申请公布号 WO1998027128(A1) 申请公布日期 1998.06.25
申请号 EP1997007053 申请日期 1997.12.16
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