发明名称 METHOD OF POST-ETCHING A MECHANICALLY TREATED SUBSTRATE
摘要 <p>Method of providing a pattern of apertures and/or cavities in, for example, a glass duct plate of a plasma-addressed liquid crystal display, in which first a mechanical treatment is performed (for example, by means of powder blasting) and then a wet-chemical etching treatment is performed to render the walls of the ducts microscopically less rough so that the optical disturbance is reduced and the glass becomes clearer again.</p>
申请公布号 WO1998027020(A1) 申请公布日期 1998.06.25
申请号 IB1997001530 申请日期 1997.12.04
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