| 摘要 |
<p>A method for producing micro-elements, such as micro-lenses and computer generated holograms using a gray scale mask formed of a high energy beam sensitive glass plate which may be darkened by direct writing of an electron beam to record a gray scale pattern corresponding to a predetermined depth level to be etched into a photoresist coated substrate. The high energy beam sensitive glass may have a base glass composition which is provided with an ion exchanged surface layer containing a high concentration of silver ions. High energy beam sensitive glass plates are exposed to various electron beam charge densities at relatively low acceleration voltages and over relatively small grid spacings to provide a wide range of gray levels. Photoresist coated substrates are exposed through the gray scale mask in a direct contact or proximity aligner or projection stepper and subsequently etched by chemically assisted ion beam milling to produce high efficiency micro-lenses and similar micro-elements having high surface resolution. The method is advantageous for mass production of micro-elements in stepper systems and by batch etching the substrate using chemically assisted ion beam milling, for example.</p> |
