METHOD OF MANUFACTURING PELLICLE AND PELLICLE MANUFACTURING JIG

摘要

A method of manufacturing a pellicle, in which a thin film which is one of the components of a pellicle to serve as a dust-proof cover of a mask used for patterning in the manufacture of a semiconductor device or a liquid crystal display panel is temporarily formed on a frame larger than a specific frame which is another component of the pellicle, adhesive is applied to the specific frame beforehand and the larger frame is put on the specific frame with adhesive to bond the thin film which is applied temporarily to the larger frame to the specific frame. The thin film which is applied to the larger frame is transferred to the specific frame and parts of the thin film which protrude from the specific frame are cut off with a physical cutting means to obtain a pellicle. Immediately after, or simultaneously when, or before the parts of the thin film are cut off with the physical cutting means, coating material which is obtained by dissolving a specific resin in organic solvent is applied to the parts of the thin film which are to be cut off with the physical cutting means.