| 摘要 |
<p>A process for making a light-sensitive positive photoresist composition containing a film forming resin, a photoactive compound, a solvent, and a polymeric additive obtained by condensing a multihydroxyphenol and a ketone, where substantially all of the multihydroxyphenol, ketone, metal ion impurities and low molecular weight polymeric fraction have been removed from the polymeric additive. The photoresist of the instant invention improves the long term shelf stability of the photoresist solution and also provides good lithographic performance.</p> |
