| 发明名称 |
A METHOD FOR REDUCING METAL ION CONTAMINANTS IN PHOTORESIST COMPOSITIONS CONTAINING AN ORGANIC POLAR SOLVENT BY ION EXCHANGE |
| 摘要 |
The present invention provides methods for producing a photoresist composition with extremely low level of metals contamination utilizing cleaned cationic ion exchange resin and anionic ion exchange resin, wherein the photoresist composition contains a polar solvent. A method is also provided for producing semiconductor devices using such photoresist compositions.
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| 申请公布号 |
WO9827461(A1) |
申请公布日期 |
1998.06.25 |
| 申请号 |
WO1997EP07054 |
申请日期 |
1997.12.16 |
| 申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
RAHMAN, M., DALIL |
| 分类号 |
G03F7/032;C08L61/06;G03F7/004;G03F7/38;(IPC1-7):G03F7/004;G03F7/022 |
主分类号 |
G03F7/032 |
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