发明名称 Hochreines opakes Quarzglas, Verfahren zu dessen Herstellung und dessen Verwendung
摘要 <p>The high-purity, opaque quartz glass containing 3 x 10<6> - 9 x 10<6> of closed cells having an average size of 20-40 mu m per 1 cm<3>, a ratio of closed cells having sizes of 100 mu m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays ( lambda =900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 mu m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730-1850 DEG C. <IMAGE></p>
申请公布号 DE69408071(T2) 申请公布日期 1998.06.25
申请号 DE1994608071T 申请日期 1994.10.10
申请人 TOSOH CORP., SHINNANYO, YAMAGUCHI, JP;NIPPON SILICA GLASS CO., LTD., TOKIO/TOKYO, JP 发明人 KAMO, KENJI, TSUKUBA-SHI, IBARAKI-KEN, JP;ONO, KOUICHI, TSUCHIURA-SHI, IBARAKI-KEN, JP;TSUKUMA, KOJI, TSUCHIURA-SHI, IBARAKI-KEN, JP;NAGATA, HIROYA, TSUCHIURA-SHI, IBARAKI-KEN, JP;ABE, EMIKO, YAMAGATA-SHI, YAMAGATA-KEN, JP;KIKUCHI, YOSHIKAZU, SAGAE-SHI, YAMAGATA-KEN, JP;FUNAKOSHI, YOSHIHARU, YAMAGATA-SHI, YAMAGATA-KEN, JP
分类号 C03B19/06;C03C3/06;(IPC1-7):C03C3/06 主分类号 C03B19/06
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