| 发明名称 |
LITHOGRAPHIC MASK DESIGN AND SYNTHESIS OF DIVERSE PROBES ON A SUBSTRATE |
| 摘要 |
Systems and methods of synthesizing probes on a substrate are provided. One or more shift reticles are utilized to uniformly add monomers to the substrate at specified locations. The shift reticles are shifted relative to the substrate between monomer addition steps. Additionally, characteristics of the desired probes may be specified at synthesis time.
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| 申请公布号 |
WO9827430(A1) |
申请公布日期 |
1998.06.25 |
| 申请号 |
WO1997US23360 |
申请日期 |
1997.12.17 |
| 申请人 |
AFFYMETRIX INC. |
发明人 |
HUBBELL, EARL, A.;STRYER, LUBERT;MITTMANN, MICHAEL, P. |
| 分类号 |
G01N33/53;B01J19/00;C07B61/00;C07K1/04;C12M1/00;C12N15/09;C12Q1/68;C40B40/06;C40B40/10;C40B40/12;C40B60/14;G01N33/566;G01N37/00;G03F1/08;G03F7/00;G06F19/00;(IPC1-7):G01N33/543;G03F9/00 |
主分类号 |
G01N33/53 |
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