Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element

摘要

A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester and a photoinitiator. The photosensitive resins are present at a total weight ratio to the monomer of at least 1.5:1.