<p>A method for controlling the temperature of a polishing slurry during chemical-mechanical polishing, the method comprising circulating the polishing slurry (28) in a chemical-mechanical polishing apparatus (10), monitoring the temperature of the polishing slurry, exposing the slurry to a temperature control element (36) during the recirculation of the polishing slurry to adjust the temperature of the polishing slurry and maintaining the temperature of the polishing slurry within a predetermined range, thereby maintaining control of the temperature of the polishing slurry. <IMAGE> <IMAGE></p>
申请公布号
EP0849041(A2)
申请公布日期
1998.06.24
申请号
EP19970310392
申请日期
1997.12.19
申请人
TEXAS INSTRUMENTS INCORPORATED
发明人
BAWA, MOHENDRA S.;SIMPSON, VIKKI SUE;GRIMES, MICHAEL H.;ALLEN, FRANKLIN LOUIS;L'ANGLOIS, KENNETH JOHN;MILLER, PALMER ARTHUR;ETHERIDGE, GARY LEE