| 摘要 |
<p>A radiation-sensitive resin composition including an alkali soluble resin and a quinonediazide compound is provided. The quinonediazide compound has the formula (1), for example: <CHEM> wherein, R<1> to R<4> are an alkyl, cycloalkyl or aryl group; a and b are an integer of 1 to 3; D<1> and D<2> are independently a hydrogen atom or a 1,2-quinonediazidosulfonyl group, provided that at least one of D<1> is a 1,2-quinonediazidosulfonyl group; A is a bonding such as single bond; and x and y are an integer of 0 to 2. The composition is suitable as a positive resist, which effectively restrains the occurrence of scum, and excellent in developability, pattern shape, sensitivity, resolution and focus latitude. <IMAGE></p> |
