发明名称 |
Method and apparatus for treatment of semiconductor material |
摘要 |
<p>The method employs a microcontroller (8) programmed to operate each of an array of nozzles (2) through which a cleaning fluid (5) is directed from a reservoir (4) at the working surface (1) of the grinding tool. Each nozzle contains a transducer (6) made e.g. from tantalum or piezoceramic material and generating ultrasound at a different frequency. The transducers are excited by oscillators (7) of various intensities with links to the microcontroller, which also varies the output of cleaning fluid through the valve supplying each nozzle from the reservoir.</p> |
申请公布号 |
EP0779647(B1) |
申请公布日期 |
1998.06.17 |
申请号 |
EP19960119964 |
申请日期 |
1996.12.12 |
申请人 |
WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AKTIENGESELLSCHAFT |
发明人 |
LUNDT, HOLGER, DR.;KOBLER, KARL;MALCOK, HANIFI |
分类号 |
B24B57/02;B23D59/00;B23D59/02;B24B1/04;B24B53/007;B24B53/017;B24D5/12;B28D5/02;B28D7/02;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):H01L21/00 |
主分类号 |
B24B57/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|