发明名称 ELECTRON BEAM IRRADIATING METHOD, CROSS-LINKING OR CURING METHOD, AND OBJECT IRRADIATED WITH ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To produce a variation in the state of cross-linking or curing of an object irradiated with an electron beam without homogeneously cross-linking or curing the object as a whole by irradiating the object with an electron beam by using a specific electron beam radiation apparatus. SOLUTION: A distribution of cross-link density, hardness, or degree of modification is formed in the thickness direction of an object by the irradiation with an electron beam. This irradiation is performed with a vacuum-tube electron beam radiation apparatus. Since this apparatus operates at a low acceleration voltage, the reachable depth of an electron beam is low, and since the acceleration voltage is easily controllable, the reachable depth of an electron beam can be easily controlled. In order to form a gradation structure or a layered structure without fail, the object is pref. thermally treated after partially cross- linked or cured in the thickness direction. The radiation voltage of the electron beam is pref. 100kV or lower in terms of controlling the reachable depth. The thickness of the object is pref. 10μm or higher.
申请公布号 JPH10158413(A) 申请公布日期 1998.06.16
申请号 JP19960336295 申请日期 1996.12.03
申请人 TOYO INK MFG CO LTD 发明人 KUWABARA MASAMI;KURIHASHI TORU;TAKAYAMA MICHIO
分类号 G21K5/04;B05D3/06;B29C35/08;C08J3/26;C08J3/28;(IPC1-7):C08J3/26 主分类号 G21K5/04
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