| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing method and a polishing device capable of realizing the high surface roughness and high-precise center thickness without any skill of an operator even if the relative positional relationship between a workpiece and a polishing tool is changed. SOLUTION: In a polishing method for polishing a workpiece 4 by rotating a polishing tool 12 after bringing a workpiece surface 4a of the workpiece 4 in contact with a polishing surface 12a of the polishing tool 12 and by relatively oscillating the workpiece 4 and the polishing tool 12, the relative positional relationship between the center axis Lb of the workpiece 4 and the rotational axis La of the polishing tool 4 in oscillating of the workpiece 4 and the polishing tool 12 is taken as the relative position D, the number of revolutions of the polishing tool 12 is taken as N, the ratio of the circumference of a circle to its diameter is taken asπ. Polishing is performed by changing the number of revolutions N of the polishing tool 12 so that the expression, 2×D×π×N = constant, may be satisfied with the change of the relative position D by oscillation of the workpiece 4 and the polishing tool 12.
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