发明名称 |
Flat cell mask ROM having compact select transistor structure |
摘要 |
A method of manufacture for flat-cell Mask ROM devices on a silicon semiconductor substrate covered with a first gate oxide layer comprises, forming a first conductor structure on the first gate oxide layer, forming a buried conductive structure within the substrate by ion implantation with a portion thereof in juxtaposition with the first conductor structure, etching away the exposed surfaces of the first gate oxide layer exposing portions of the semiconductor, forming a second gate oxide layer on the surface of the semiconductor, and forming a second conductor structure on the second gate oxide layer.
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申请公布号 |
US5767553(A) |
申请公布日期 |
1998.06.16 |
申请号 |
US19960647645 |
申请日期 |
1996.05.15 |
申请人 |
UNITED MICROELECTRONICS CORPORATION |
发明人 |
HONG, GARY YEUNDING;HSUE, CHEN-CHIU |
分类号 |
H01L21/8246;H01L27/02;H01L27/112;H01L27/12;(IPC1-7):H01L29/76 |
主分类号 |
H01L21/8246 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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