发明名称 |
Method for producing heat-resistant synthetic quartz glass |
摘要 |
A porous silica body with a density of 0.1 g/cm3 to 0.5 g/cm3 and a density variation of less than 30% is subjected to a first heat-treatment in an ammonia-containing atmosphere, a second heat-sintering in non-oxidizing atmosphere, and further heat-treatment at a temperature in the range of 1400 DEG C. to 2000 DEG C. under an increased pressure of 500 kg/cm2 or more in a non-oxidizing atmosphere.
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申请公布号 |
US5766291(A) |
申请公布日期 |
1998.06.16 |
申请号 |
US19960731595 |
申请日期 |
1996.10.16 |
申请人 |
HERAEUS QUARZGLAS GMBH |
发明人 |
SATO, TATSUHIRO;FUJINOKI, AKIRA |
分类号 |
C03B20/00;C03B8/04;C03B19/06;C03B19/14;C03B32/00;(IPC1-7):C03B19/01;C03B19/09;C03B37/00;C03C15/00 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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