发明名称 |
Exposure apparatus and method |
摘要 |
An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.
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申请公布号 |
US5767949(A) |
申请公布日期 |
1998.06.16 |
申请号 |
US19960727762 |
申请日期 |
1996.10.08 |
申请人 |
HITACHI, LTD. |
发明人 |
NOGUCHI, MINORI;KENBO, YUKIO;OSHIDA, YOSHITADA;SHIBA, MASATAKA;YOSHITAKA, YASUHIRO;MURAYAMA, MAKOTO |
分类号 |
G03F1/08;G03F1/84;G03F7/20;H01L21/027;H01L21/30;(IPC1-7):G03B27/42;G03B27/32;G03B27/72 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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