| 摘要 |
PROBLEM TO BE SOLVED: To enhance a positioning accuracy of opposing holes of electrode placed on both of the faces of an electric field generating means. SOLUTION: Photo resist masks 14, 15 having the same mask patterns are respectively set to photo resist mask stages 16, 17 for an exposing device which are disposed to both of the sides of an electric field generating means and are connected by connection members. A light passing through the photo resist masks 14, 15 is projected on a position of a penetration hole of an electrostatic field generating means which is set on a head stage 18. The exposed portion is subjected to an etching process to form a hole on an electrode. A laser light is emitted by using the hole of the electrode as a mask to penetrate an insulation body to form a penetration hole thereon. |
