发明名称 PRODUCTION OF PATTERN-DYEING PRODUCT
摘要 <p>PROBLEM TO BE SOLVED: To give a dyeing pattern of high resolution on a polymer thin film by partially irradiating a polymer thin film containing a quinone and a polymer bearing functional groups which form amino group by irradiation with light and dyeing the irradiated thin film. SOLUTION: A polymer thin layer 1 containing, as effective components, quinone and a polymer substance bearing functional groups forming amino groups by irradiation with light, for>r example, a functional group of the formula: COO-N=CR1 R2 (R1 and R2 are independently an alkyl, an aryl, H) is partially irradiated with light through a photo-mask 3. The polymer thin layer having the parts where amino groups are liberated by light irradiation is dyed to give the objective pattern-dyed product having the dyed parts 5. Since the shape of the thin film is not deformed even after dyeing, this is useful in production of color filters.</p>
申请公布号 JPH10158982(A) 申请公布日期 1998.06.16
申请号 JP19960332765 申请日期 1996.11.27
申请人 NISSHA PRINTING CO LTD 发明人 SUYAMA HIROSHI;KADOOKA MASAHIRO
分类号 G02B5/20;D06P5/00;D06P5/20;(IPC1-7):D06P5/00 主分类号 G02B5/20
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