发明名称 |
VERFAHREN ZUR HERSTELLUNG VON DIAMANTMEMBRANEN FÜR RÖNTGENLITHOGRAPHIE |
摘要 |
<p>A substantially compressive stress-free, pin-holes free, and defects free continuous polycrystalline diamond membrane for an x-ray lithography mask is produced by placing a prepared substrate into a hot filament chemical vapor deposition reaction chamber, pre-heating the substrate to 400 DEG C.-650 DEG C. in the presence of an inert gas, heating the substrate to 650 DEG C.-700 DEG C. in the presence of hydrogen and carbon compounds, and chemically vapor depositing a polycrystalline diamond membrane onto the substrate.</p> |
申请公布号 |
AT166997(T) |
申请公布日期 |
1998.06.15 |
申请号 |
AT19920914514T |
申请日期 |
1992.06.25 |
申请人 |
MONSANTO COMPANY |
发明人 |
GARG, DIWAKAR;MONK, VYRIL A.;MUELLER, CARL, F. +DI |
分类号 |
C23C16/27;G03F1/22;G21K1/10;(IPC1-7):G21K5/00;G03F1/14;B05D3/06 |
主分类号 |
C23C16/27 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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