发明名称 Cleaning process
摘要 A cleaning process which comprises contacting a printed circuit board to which a residue of a flux is attached with a cleaning composition containing a first solvent and an organic compound, and then with a second solvent. The first solvent is an aliphatic hydrocarbon solvent having 5 to 20 carbon atoms. The organic compound is a 1-alkyl-2-pyrrolidone having 3 to 18 carbon atoms, a tri-alkylphosphine oxide having 3 to 8 carbon atoms or a di-alkylsulfoxide having 3 to 8 carbon atoms. The organic compound is in an amount of 10 to 300 g per liter of the hydrocarbon solvent. The cleaning composition does not contain a halogen compound.
申请公布号 US5767048(A) 申请公布日期 1998.06.16
申请号 US19970864443 申请日期 1997.05.28
申请人 KURITA WATER INDUSTRIES LTD. 发明人 OBUSE, HIROSHI
分类号 C11D7/24;C11D1/755;C11D1/79;C11D7/32;C11D7/34;C11D7/36;C11D7/50;C11D11/00;C23G5/02;H01L21/304;H05K3/26;(IPC1-7):B08B3/08;C23G5/036;C23G5/032;C23G5/024 主分类号 C11D7/24
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