发明名称
摘要 A depositing apparatus includes a profile-following mechanism having a translational displacement mechanism portion and a rotation mechanism portion adapted to allow a head to be swung in the directions of both X and the Y axes so that the head follows a profile of the surface of workpiece smoothly around a first contact point, thereof with the workpiece, serving as a fulcrum point.
申请公布号 JP2763064(B2) 申请公布日期 1998.06.11
申请号 JP19930159476 申请日期 1993.06.29
申请人 HITACHI SEISAKUSHO KK 发明人 DOI HIROYUKI;WAI SHINICHI;SHIOKAWA TAKEJI;FUJIKAWA KEIJI;HASHIMOTO YUTAKA;MATSUOKA MASATO
分类号 B05C5/00;B05C5/02;B23Q35/10;H01L21/52;H05K3/34;H05K13/04 主分类号 B05C5/00
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