发明名称 HIGH RESOLUTION POSITIVE ACTING DRY FILM PHOTORESIST
摘要 A positive acting photoresist composition (e.g., a monolayer dry film) which is strippable in aqueous alkaline solution comprises a photo acid generator and a UV-trans parent resin binder system which allows efficient photo bleaching of the photoactive comp onent. An acid functional cellulosic resin may be the only binder resin, an acidic acrylate resin being optional. The dry coating is flexible and may be used as an etch and plating resist.</ SDOAB>
申请公布号 CA2224312(A1) 申请公布日期 1998.06.10
申请号 CA19972224312 申请日期 1997.12.10
申请人 MORTON INTERNATIONAL, INC. 发明人 BELTRAMO, GRIEG B.;KOES, THOMAS A.
分类号 G03F7/004;C08K5/42;C08L1/08;C08L33/00;C09D7/12;C09D101/08;C09D133/00;G03F7/039;(IPC1-7):G03F7/039;G03F7/032 主分类号 G03F7/004
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