发明名称 |
Polymer for positive acid catalyzed resists |
摘要 |
The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
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申请公布号 |
US5763536(A) |
申请公布日期 |
1998.06.09 |
申请号 |
US19960638239 |
申请日期 |
1996.04.26 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
THACKERAY, JAMES W.;SINTA, ROGER F.;DENISON, MARK D.;ABLAZA, SHERI L. |
分类号 |
C08F8/00;C08F8/14;G03F7/004;(IPC1-7):C08F8/14 |
主分类号 |
C08F8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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