发明名称 Shallow trench isolation with oxide-nitride/oxynitride liner
摘要 Disclosed is an improved process and liner for trench isolation which includes either a single oxynitride layer or a dual oxynitride (or oxide)/nitride layer. Such a process and liner has an improved process window as well as being an effective O2 diffusion barrier and resistant to hot phosphoric and hydrofluoric acids.
申请公布号 US5763315(A) 申请公布日期 1998.06.09
申请号 US19970790266 申请日期 1997.01.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;SIEMENS AKTIENGESELLSCHAFT;KABUSHIKI KAISHA TOSHIBA 发明人 BENEDICT, JOHN PRESTON;DOBUZINSKY, DAVID MARK;FLAITZ, PHILIP LEE;HAMMERL, ERWIN N.;HO, HERBERT;MOSEMAN, JAMES F.;PALM, HERBERT;YOSHIDA, SEIKO;TAKATO, HIROSHI
分类号 H01L21/76;H01L21/762;(IPC1-7):H01L21/76 主分类号 H01L21/76
代理机构 代理人
主权项
地址