发明名称 Semiconductor memory device having an interconnect structure which improves yield
摘要 A semiconductor memory device in which word lines are arranged so as to improve the yield with respect to bridging defects. The semiconductor memory device of the present invention has a plurality of interconnects arranged in parallel on a cell array portion, in which the interconnects are comprised of power lines and ground lines arranged alternately on the cell array portion, main word lines arranged on each side of the power lines, and a plurality of block word lines sequentially arranged between a single main word line and a ground line adjacent thereto and controlled by the main word line. In this way, interconnects are arranged in alternating groups so that interconnects having the same logic level during the standby mode are grouped together. The result of this arrangement is that interconnect bridges within a group will not lead to increased standby current, thereby substantially improving the yield of the semiconductor memory device. In addition, the spacing between groups of interconnects may be increased, further reducing the probability of increased standby current due to a bridging defect, thereby further increasing the yield.
申请公布号 US5763908(A) 申请公布日期 1998.06.09
申请号 US19960687925 申请日期 1996.07.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HAN, EUI-GYN;RYU, KWANG-SUK;LIM, KI-WON
分类号 H01L27/06;G11C11/401;G11C11/407;H01L21/3205;H01L21/8234;H01L21/8242;H01L23/52;H01L27/10;H01L27/108;H01L27/11;(IPC1-7):H01L27/10 主分类号 H01L27/06
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