| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition superior in sensitivity, resolution, focus allowance, heat resistance, and developability and capable of restraining stationary wave effect and forming a good pattern form by incorporating an alkali-soluble resin and a specified compound in the radiation sensitive resin composition. SOLUTION: This radiation sensitive resin composition contains the alkali- soluble resin and a quinonediazido compound and the other compound represented by the formula in which each of R<1> and R<2> is an H atom or an alkyl, alkoxy, nitro, hydroxyalikyl, or hydroxyalkoxy group. The substrate of a silicone wafer or the one coated with aluminum of the like is coated with a solution prepared by dissolving this composition to form a resist film and this film is irradiated with radiation so as to form a desired resist pattern, thus permitting the resist pattern to be obtained by development. |
