发明名称 |
Method for production of SiO2 glass material having regions changed in light refractive index and SiO2 glass material produced by the method |
摘要 |
A method for producing a SiO2 glass material having regions changed in light refractive index is provided which comprises implanting at least 5x1019 Ge ions/cm3 into a SiO2 glass substrate, heat-treating the substrate at a temperature exceeding 300 DEG C., and exposing the substrate to an ultraviolet light. Also provided is a SiO2 glass material produced by the method.
|
申请公布号 |
US5763340(A) |
申请公布日期 |
1998.06.09 |
申请号 |
US19970783041 |
申请日期 |
1997.01.14 |
申请人 |
AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY, MINISTRY OF INTERNATIONAL TRADE & INDUSTRY |
发明人 |
NISHII, JUNJI;FUKUMI, KOHEI;CHAYAHARA, AKIYOSHI;FUJII, KANENAGA;YAMANAKA, HIROSHI |
分类号 |
G02B1/00;C03C3/06;C03C4/04;C03C21/00;C03C23/00;G02B6/12;G02B6/13;G02B6/134;(IPC1-7):C03C13/04 |
主分类号 |
G02B1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|