| 摘要 |
PROBLEM TO BE SOLVED: To provide a carrying device capable of efficiently removing the dust in a chamber. SOLUTION: An exposed device composite a carrying system 30 to carry a reticule between a storage and separation unit 23 sorer (and storage containers 21, 22) to store the reticule and an exposure device 40 to exposure to a wafer W using reticule. The exposure device is provided with a chamber 10 to surround the storage and separation unit 23, or the like and provided with first evacuation divices 18a-18c which are provided in the vicinity of the storage and separation unit 23 and evacuate a peripheral part of at least the storage and separation unit 23 in the chamber 10, and a second evacuation device 19 which is arranged in the vicinity of the exposure device and evacuates at least its peripheral part. The peripheral part of the storage and separation unit 23 which is provided with a slidable part and easy to generate the dust is evacuated by the first evacuation devices 18a-18c to keep the inside of the chamber clean. |
