发明名称 DMOS transistors having trenched gate oxide
摘要 Improved power MOSFET structure, and fabrication process are disclosed in this invention to achieve cost savings by simplified device structure and fabrication processes, and also by reducing the required die size. Specifically, in a novel MOSFET device, insulation of mobile ions are achieved by extending the poly gate and metal contacts such that the passivation layer is no longer required and the fabrication process is simplified such that the MOSFET device can be manufactured at a lower price. Furthermore, in another MOSFET device, the gate runner is used to replace the field plate such that the requirement of a field plate as that in a conventional MOSFET device is also eliminated and, by reducing the die size, the cost of manufacture is further reduced.
申请公布号 US5763915(A) 申请公布日期 1998.06.09
申请号 US19960607715 申请日期 1996.02.27
申请人 MAGEMOS CORPORATION 发明人 HSHIEH, FWU-JUAN;LIN, TRUE-LON;NIM, DANNY CHI;SO, KOON CHONG;TSUI, YAN MAN
分类号 H01L21/336;H01L29/06;H01L29/40;H01L29/423;H01L29/78;(IPC1-7):H01L29/76;H01L29/94 主分类号 H01L21/336
代理机构 代理人
主权项
地址