Holographic method for generating three dimensional conformal photo-lithographic masks

摘要

A three-dimensional photo mask is formed from a substrate having a first side and a three-dimensional side. A hologram is provided on the first side of the substrate. The three-dimensional side of the substrate has a photosensitive resist material provided thereon. The hologram includes information that defines features to be imaged onto the photosensitive resist material. A method and a system are disclosed for producing the three-dimensional mask.