Cleaning especially of semiconductor wafer using ozone

摘要

An apparatus for cleaning and/or oxidising articles, especially semiconductor wafers (2), includes a water pipeline (9) in which water is pumped (10) towards the article in an article holder and into which a feed line (18) feeds ozone generated by an ozone generator (19), the water pipeline (9) including a tube reactor (12) which allows complete dissolution of the ozone in the water before it reaches the article. Also claimed is an article (especially wafer) cleaning and/or oxidation process, in which gaseous ozone is fed into a water pipeline (9) and completely dissolved in the water which is then applied to the article. Further claimed is an ozone generator especially for use in the above apparatus and process.