| 发明名称 |
METHOD FOR PRODUCING A TITANIUM MONOPHOSPHIDE LAYER AND ITS USE |
| 摘要 |
The invention relates to a method for producing a titanium phosphide layer, wherein initially a carrier is placed in a reactor. Subsequently, a TiN layer is deposited on the carrier by adding TiCl4 and NH3 in the reactor. The TiN layer is tempered by adding PH3 in the reactor immediately after the TiN layer has deposited in order to form the titanium monophosphide layer on the TiN layer. |
| 申请公布号 |
WO9824117(A1) |
申请公布日期 |
1998.06.04 |
| 申请号 |
WO1997EP06497 |
申请日期 |
1997.11.20 |
| 申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAND;FROESCHLE, BARBARA;LEUTENECKER, ROLAND;RAMM, PETER |
发明人 |
FROESCHLE, BARBARA;LEUTENECKER, ROLAND;RAMM, PETER |
| 分类号 |
H01L21/285;C23C16/30;C23C16/34;C23C16/56;H01L21/28;H01L21/3205 |
主分类号 |
H01L21/285 |
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