发明名称 Two-fluid cleaning jet nozzle for cleaning semiconductor wafers during production
摘要 The nozzle has an accelerator for driving the droplets into the atmosphere. The cross-sectional face of the narrowest section of the gas passage in the atomiser is larger than that of the narrowest section of a passage in the accelerator, which contains a straight tube with a circular bore, 30 to 200 mm long and bore area of 3 sq. mm. The tube bore diverges as the bore of a Laval nozzle from the end, coupled to the atomiser, in the direction of the droplet ejection direction. Typically the atomiser is cylindrical. The atomiser configuration may provide convergence in the direction of the end coupled to the accelerator.
申请公布号 DE19740996(A1) 申请公布日期 1998.06.04
申请号 DE19971040996 申请日期 1997.09.17
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP;TAIYO TOYO SANSO CO., LTD., OSAKA, JP 发明人 KANNO, ITARU, TOKIO/TOKYO, JP;TADA, MASUO, OSAKA, JP;OGAWA, MITSUHIRO, OSAKA, JP
分类号 B05B7/04;B08B3/02;H01L21/00;H01L21/304;(IPC1-7):B08B3/02;B05B7/00;H01L21/302 主分类号 B05B7/04
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