| 摘要 |
<p>UV-laser photoablation is used for the 3-dimensional patterning of biological and chemical substances onto polymer and other UV-absorbing substrates. This method creates ablated lines, holes, or entire networks of structures which may selectively contain a chemical substance of interest and have critical dimensions in the range of 1 - 1000 νm. High-energy pulses are fired at a protected polymer substrate (2) from an UV excimer laser, thereby creating an ablated cavity (3) which passes through the protective layer and into the underlying substrate. Complex geometrical structures may be fabricated by repetitive firing of the laser through a series of mask onto stationary substrates. The resulting ablated-polymer structures show increased rugosity which enhances the surface area for binding chemical or biological receptors, including enzymes, antibodies, nucleic acids, other polymers, gels, membranes, etc. Binding may then be accomplished via simple adsorption or through covalent and/or noncovalent conjugation to the entire surface (both ablated and non-ablated). After the binding step, the protective layer (5) can simply be peeled off, thereby removing the binding material from all surfaces, except that which is defined by UV-laser photoablation. The resulting surface is then left in a state which is chemically and geometrically defined by the initial UV-laser exposure.</p> |
