发明名称 Plasma gas processing
摘要 <p>A plasma enhanced gas reactor including a reaction chamber has a pair of field enhancing electrodes 106,107 each of which has an axial passage there through, one admitting a first reactant gas 201 and the other removing processed reactant, a second reactant 203 being flowed so at to intersect the first reactant in the region of the plasma 202. Other relationships between plasma and reactant are shown (fig 2b-2e). As shown in fig 3 a plurality of such reactors may be established in parallel.</p>
申请公布号 GB2319941(A) 申请公布日期 1998.06.03
申请号 GB19970023249 申请日期 1997.11.05
申请人 * AEA TECHNOLOGY PLC 发明人 ROBERT FREW * GILLESPIE;STEPHEN IVOR * HALL;DAVID * RAYBONE;FIONA * WINTERBOTTOM
分类号 B01D53/32;B01J12/00;B01J19/08;B01J19/12;H05H1/24;(IPC1-7):H01J37/32;H05H1/46 主分类号 B01D53/32
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